Area Overview

• AO-01 North American Market Outlook for Ultraviolet and Electron Beam Technologies
  by G. Cohen ( RadTech-UV+EB Technology Nonprofit Association )
  

• AO-02 European Market Overview
  by D. Engberg ( Perstorp AB )
  

• AO-03 Markets Overview and Progress of UV/EB Curing TEchnoligy in China 2022
  by J. Nie ( RadTec China )
  

• AO-04 An Overview of Radiation Curing in Malaysia
  by M.H. Harun ( Univ. of Haute Alsace )
  

• AO-05 Japanese Market Overview 2022
  by I. Igarashi ( TOAGOSEI Co.,Ltd.)
  

Keynote Lecture

• KL-01 Some modern aspects of photopolymerization reactions in 3D printing
  by X. Allonas( Laboratory of Macromolecular Photochemistry and Engineering )
  

• KL-02 Membrane-based Direct Air Capture-Possibilities and Prospect
  by S.Fujikawa ( Kyushu Univ.)
  

• KL-03 Preparation, Properties and Additive Manufacturing of Semicrystalline Polyme Prodeuced from Thiol-Ene Photopolymerizations
  by C.Bowman ( Univ. of Colorado )
  

G1 Radiation and Photochemistry

• G1-01 Novel glyoxylate-based photopolymerizations as alternative to alpha amino ketones
  by S. Van den Branden ( IGM Resins, Innovation and Technology )
  

• G1-02 Design of Sulfonium Compounds as Photo-acid Generators to Long-wavelength Photosensitized Initiating System
  by T. Tsuchimura ( FUJIFILM, Synthetic Organic Chemistry Laboratories )
  

• G1-03 Role of Weakly Coordinating Anions in Iodonium Salt as co-Initiator for Photopolymerization Using NIR-LED Light Source
  by A. Shiraishi ( San-Apro Ltd., )
  

• G1-04 Photo-active Polymeric Dormant:Design and Application to Precise UV-Curing
  by T. Suga ( Waseda Univ. )
  

• G1-05 Design of Light-Diffusing Film Having Polymer Columnar Structure Formed by Collimated UV Light Irradiation and Its Application to Digital Signage
  by H. Fukushima ( Lintec Corp. )
  

• G1-06 Development of Novel Proxide-Free Dual-Curing Initiator System for the Polymerization of Mrthacrylates
  by I.Takahashi (Mitsui Chemicals, Inc.,)
  

• G1-07 Basic technology of UV ink
  by J. Suenaga (TOYO INK CO., Ltd. )
  

• G1-08 Cross-linking Photopolymerization of Monoacrylate Initiated by TypeII Photoinitiator
  by Y. Sanai (TOAGOSEI Co., Ltd. )
  

G-2 Advanced materials and application

• G2-01 Tough soft materials with sacrificial structure
  by J.Gong ( Hokkaido Univ. )
  

• G2-02 Development of a novel adamantane cross-linker
  by K.Tsubaki ( Osaka Organic Chemical Industry Ltd. )
  

• G2-03 Advanced materials for next-generation Micro LED Displays
  by K. Goto ( TORAY Industries, Inc. )
  

• G2-04 Synthesis of UV curable amide-imide resin and its physical properties
  by Y. Yamada ( DIC Corp. )
  

• G2-05 Design Concept of Positive-tone Photosensitive Polyimide for Submicron Patterning
  by D. Yokimori( Taiyo Holdings Co.,Ltd.)
  

• G2-06 Development of Temperature-response Cell Culture Membranes by Electron Beam induced Graft Polymerization
  by M. Washio ( Waseda Univ. )
  

• G2-07 Unique Structural Characteristics of Graft-Type Proton Exchange Membaranes using SANS Partial Scattering Function Analysis
  by Y. Zhao ( Inst. for Quantum Science and Technology ) )
  

• G2-08 Direct Observation and Semiquantitative Analysis of Hierachical Structures in Graft-type Polymer Electrolyte Membranes using AFM Technique
  by T. Motegi ( Takasaki Advanced Radiation Research Inst.,National Inst. for QST )
  

• G2-09 How Cationc Curing can be a Sustainable Solution for Challenging Application
  by D, Engberg ( Persorp AB )
  

• G2-10 Light-driven Photoalignment and Surface Morphing in Polymer Films from the Top Surface
  by T. Seki ( Nagoya Univ. )
  

• G2-11 Photoalignment in a liquid crystalline azobenzene copolymer with proton conductive side-chain units
  by K. Hirata ( Rikkyo Univ. )
  

• G2-12 Development of polyrotaxane synthesis in a aqueous system using photodimerization of cinnamic acid derivatives
  by M. Kidowaki ( Shibaura Inst. of Technology )
  

• G2-13 Light-induced dispersibility switching for carbon nanotube thin-film preparation
  by H. Jintoku ( National Inst. of Advanced Science and Technology )
  

• G2-14 Dopamine acrylamide,as an UV adhesive material found out in biodiversity
  by R. Akaishi ( Osaka Organic Chemical Industry Ltd. )
  

• G2-15 Development of Adhesives Using Biomass Materials
  by S. Mano ( ThreeBond Co.,Ltd )
  

• G2-16 Development of Degradable Pressure-sensitive Adhesives on UV and Ultrasound Irradiation
  by H. Tachi ( Osaka Metropolitan Univ. )
  

• G2-17 Strongly-segregating Chemically Tailored Block Coplymers For sub-10mm Patterning
  by T. Hayakawa ( Tokyo Inst. of Technology )
  

• G2-18 Characterization of UV(containing 380-420nm)-absorbing methacrylate polymers
  by T. Shimeno ( Shin-Nakamura Chemical Co.,Ltd )
  

• G2-19 Cyclopolymerizable Monomer "AOMA" and its derivatives
  by A.Kanaya ( Nippon Shokubai Co.,Ltd. )
  

  G2-20 Development of Acrylates using New Ester Exchange Reaction
  by K.Ofusa ( Toasgosei Co.,Ltd. )

G3 Radcure equipment, testing, and measurement

• G3-01 History and Evolution of UV measurement and the latest trends in the Industry
  by P. Swain ( Electronc Instrmentation and Tecnology )
  

• G3-02 A challenge of normal force prediction of UV curable resin during photopolymerization
  by K. Taki ( Kanazawa Univ. )
  

• G3-03 Direct and/or sensitized irradiation processes in cationic curing system
  by K. Kawamura ( Heraeus K.K. )
  

G4 Functional coatings

• G4-01 Multifunctional Coating Using Fluorinated Polyhedral Oligomeric Silsesquioxane-Based Hybrid Polymers
  by M. Yamahiro ( JNC Corp. )
  

• G4-02 Organic-inorganic Hybrid Coating prepared from Norbornene modified Zirconia Nanoparticles
  by K. Matsukawa ( Kyoto Inst. of Technology )
  

• G4-03 Epoxy group-containing acrylic acrylate coatings with UV cationic curability
  by K. Aoyama ( Kyoeisha Chemical Co.,Ltd. )
  

• G4-04 Development of UV Curable Backside Protection-Film that Eliminates the Thermosetting Process
  by Y. Tanaka ( Lintec Corp. )
  

• G4-05 Control of diffraction beam and polarized fluorescence based on photoalignment and polarization gratings in liquid crysatalline polymeri films
  by N. Kawatsuki ( Univ. of Hyogo )
  

• G4-06 Cure behavior of UV curable coatings with UV-LED lamps for optical fiber productin
  by N. Shinohara ( Japan Fine Coatings Co.,Ltd. )
  

• G4-07 Investigation of cure behavior of UV curable coatings for optical fiber by UV-LED lamps
  by H. Uchida ( Japan Fine Coatings Co.,Ltd. )
  

G5 Others

• G5-01 Mechanism and Applications of Photosensitizer Anthracure
  by K. Yamada ( Air Water Performance Chemical Inc. )
  

• G5-02 Development of ZrO2 nanocrystal dispersion with gap-fill property for hard-mask
  by K. Noda ( Tokyo Ohkas Kogyo Co. Ltd.)
  

• G5-03 Development of UV Curable Non-Solvent High Refractive Index Formulation used Inorganic Nanocrystal for Display
  by Y. Park ( Tokyo Ohka Kogyo Co.,Ltd )
  

S1 Materials for mobile network tecnology

• S1-01 Surface modificatin of carbon materials by polybenzimidazole and their applicatin
  by T. Fujigaya ( Kyushu Univ. )
  

• S1-02 Low Transmission loss Polyimides Substrates correspomdings to Millimeter waves applicatin for the 5G standard
  by T. Tazaki ( Arakawa Chemical Industries, Ltd.)
  

• S1-03 Breaking the scaling barrier of semiconductor with 3D approach
  by F. Inoue ( Yokohama National Univ. )
  

• S1-04 Molecular design of Low Dielectric Loss Photosensitive Polyimide for 5Gmm wave application
  by M. Tomioka ( Toray Industries Inc. )
  

• S1-05 Low Dielectric Material and Bonding between Organic and Inorganic for Post 5G/6G
  by H. Hapoya ( Daicel Corp. )
  

• S1-06 Investigation of Dielectric Properties of Soluble Polyphenylene Ether and its Composite Material
  by S. Sekiguchi ( Taiyo Holdings Co.,Ltd. )
  

S2 Biomedical applications

• S2-01 Multi-layer 3D integrated microfluidic chips for diagnostics and pharmaceuticals
  M. Taguchi ( National Inst. for QST )
  

• S2-02 Functional cell culture substrates to regulate cellular processes
  by T.G.Oyama ( National Inst. for QST )
  

• S2-03 Radiation-crosslinked hydrogels for contact lenses containing an environmental-feiendly cellulose derivative
  by H. Hiroki ( National Inst. for QST )
  

• S2-04 Ensemble NV-center in diamond for quantum sensing created by high fluence electron beam irradiation
  by S. Ishii ( National Inst. for QST )
  

• S2-05 Design of Spatio-Temporal Biomaterials for Materiobiology
  by K. Uto ( National Inst. for Materials Science )
  

• S2-06 Application of cell-based analysis with nano and microfabricated substrates to mrchanobiology and biomedical researches
  by H. Miyoshi ( Tokyo Metropolitan Univ. )
  

S3 Contribution to SDGs

• S3-01 Monomers from bio-source for photopolymerization
  by J. Nie ( RadTech China )
  

• S3-02 Plant-based UV absorber obtained by simultaneous enzymatic saccharification and comminution
  by K.Shikinaka ( National Inst. of Advanced Industrial Science and Technology )
  

• S3-03 Photo-reworkable adhesives
  by H. Akiyama ( National Inst. of AIST )
  

• S3-04 Fabrication of photo-adhesive materials utilizing chemical properties of 2-mercaptopyridyl groups
  by M. Furutani ( National Inst. of Technology, Fukui College)
  

• S3-05 Synthesis and Photopolymerization of Bio-based Polyester Acrylates
  by T. Iso ( Toagosei Co.,Ltd. )
  

• S3-06 Photo-controlled hydrophilicity of degradable bioplastics in marine environment
  by T. Kaneko ( Japan Advanced Inst. of Science and Technology )
  

• S3-07 Plastics to fertilizers:chemical recycling of a bio-based polycarbonate
  by D. Aoki ( Chiba Univ. )
  

• S3-08 Sustainable coating process by UV curable powder
  by K. Yamamoto ( Daicel-Allnex Ltd. )
  

• S3-09 Approach from acrylate materials towards susutainable development goals
  by F. Tanabiki ( Daicel-Allnex Ltd. )
  

S4 2D and 3D nano/micro fabrication

• S4-01 Current Status and Prospect for EUV Lithography
  by T. Watanabe ( Univ. of Hyogo )
  

• S4-02 Autonomous Micro-Laser Processing
  by Y. Kobayashi ( The Univ. of Tokyo )
  

• S4-03 Multi-material microscale 3D printing:methods and materials
  by S. Maruo ( Yokohama National Univ. )
  

• S4-04 Organized Microfibrillation: A remarkably versatile printing platform for susutainable packing, sensors and wearable tecnology
  by E. Sivaniah ( Kyoto Univ. )
  

• S4-05 Preparation of photosensitive engineering plastics utilizing reaction development patterning
  by T. Oyama ( Yokohama National Univ. )
  

• S4-06 Recent Research activity for EUV Lithography at QST
  by H. Yamamoto ( National Inst. for QST)
  

• S4-07 Morphological Transformation of a Triangular Azo Dye Assembly
  by M. Han ( Kongju National Univ.)
  

• S4-08 Microstructure formation on glass substrates for high-productivity fabrication of micro-vias using 248nm excimer
  by Y. Kawasuji ( Gigaphoton Inc.Inc., )
  

• S4-09 Regio selective electroless plating on micro patterning and photo responsive materials for all-wet multilayer interconnection formation technology
  by Y. Kawakami ( Nikon Corp. )
  

• S4-10 Synthesis of polysilane modified with glycidyl methacrylate and fabrication of negative-tone photopatterns
  by K. Sugita ( Tokyo Univ. of Science )
  

S5 Antibacterial and antiviral functional materials

• S5-01 Recent progress and future prospects of AlGaN Deep-UV LED
  by H. Hirayama ( Riken )
  

• S5-02 Inactivation of novel coronavirus by deep UV light
  by T.Minamikawa ( Tokushima Univ. )
  

• S5-03 Inactivation of microorganisms by ultraviolet light
  by T. Takei ( Iwasaki Electric Co.,Ltd. )
  

• S5-04 Inactivation of pathogens using 222-nm UV-C with an optical fiber
  by H. Ohashi ( Ushio Inc. )