Area Overview

• A-1 Grouth & Use of UV/EB Technology in the American Markets
  by P. Elias ( Sartomer )
  

• A-2 From Chemistry to Radiation Curing Solutions
  by M. S. Holt ( Ciba Specialty Chemicals )
  

• A-3 Asian Radcure Market
  by V. Luo ( UCB Chemicals Asia Pacific )
  

• A-4 Status of RadTech in China
  by X. Hong ( Tsinghua Univ. )
  

• A-5 Radiation Processing in India: Current Status and Future Program
  by J. P. Mittal ( Bhabha Atomic Research Centre )
  

• A-6 Radiation Curing Technology Progress and its Industrial Application in Japan
  by T. Ukachi ( JSR )
  

G-6 Markets and Economics

• M-1 Technology and Maeket of UV/EB Curing in Indonesia
  by S. Danu ( National Nuclear Energy Agency )
  

S-3 New Horizon in Materials Chemistry

• N-1 Two-photon Absorptivities of Common Photoinitiators Characterized via Degenerate and Nondegenerate NLO Methods
  by K. D. Belfield (Univ. of Central Florida )
  
  

• N-2 Entering New Dimensions in Radiation Curing
  by B. Prantl ( BASF )
  

• N-3 Photonic Crystals from Polymer Colloids
  by R. Zentel ( Johannes Gutenberg Univ. )
  

• N-4 Direct Microfabrication Using an X-ray Micro-beam with a Single Refractive Lens
  by T. Katoh ( Sumitomo Heavy Industries )
  

• N-5 Highly Efficient Photo-generated Surface Relief Formation in Liquid Crystalline Azobenzene-containing Polymer Films
  by T. Seki ( Nagoya Univ. )
  

G-2 Chemistry: Monomers, Oligomers/Prepolymers, Additives, Reaction, Mechanisms

• C-1 Cationic UV-curing: Recent Advances in Products and Applications
  by A. C. Carroy ( Dow Chemical )
  

• C-2 New Developments in High Performance UV-curable Systems
  by C. Decker ( Univ. de Haute Alsace )
  

• C-3 Yellowing of UV Curable Coatings upon Exposure to Fluorescent Light
  by Z. Komiya ( JSR )
  

• C-4 Mechanism of Hydrogen Gas Generation from UV Curable Resin
  by K. Yamamoto ( JSR )
  

• C-5 Electron Beam Curing and Cure Grafting of Charge Transfer Monomer Complexes on Cellulose - comparison with UV Systems
  by J. Garnett ( Univ. of Western Sydney )
  

• C-6 Free Volume Distribution of Polymers for Photoreactions and Electron Beam Reactions Probed with a Photochromic Reaction
  by T. Yamashita ( Tokyo Univ. of Science )
  

• C-7 Radiation Polymerization and Crosslinking Behaviour of Themoresponsive N-isopropylacrylamide in Aqueous Solutions
  by S. P. Sabharwal ( Bhabha Atomic Research Centre )
  

• C-8 Styrene Grafted and Sulfonated Proton Conducting Membranes Based on Radiation-crosslinked Polytetrafluoroethylene and their Fuel Cell Applications
  by T. Yamaki ( Japan Atomic Energy Research Institute )
  

• C-9 The Photopolymerization of Thiol-enes: New Thiol and Ene Monomers with Expanded Versatility
  by C. E. Hoyle ( Univ. of Southern Mississippi )
  

• C-10 Development of Novel Photobase Generators and their Use in UV Curing System
  by M. Tsunooka ( Osaka Prefecture Univ. )
  

• C-11 UV/EB Cyrable Dendritic/hyperbranched Ologomers: Preparation and Properties
  by S. Wenfang ( Univ. of Science and Technology of China )
  

• C-12 Visible light-induced Polymerization of Epoxides Using Photoacid Generators and Benzoquinonylsulfanyl Derivatives
  by K. Suyama ( Osaka Prefecture Univ. )
  

• C-13 Synthesis and Photocrossing Reaction of Polyesters with Pendant Oxetane Groups by the Chemo-selective Alternating Copolymerization of 3-Ethyl-3-Hydroxymethyl Oxetane with Carboxylic Anhydride
  by H. Kudo ( Kanagawa Univ. )
  

• C-14 Application of Acrylated Alkoxysilanes for UV Curable Coatings
  by M. Chikada ( Arakawa Chemical )
  

• C-15 Sensitivity Enhancement of Anionic UV-curing by Base Amplifiers
  by K. Arimitsu ( Tokyo Univ. of Science )
  

• C-16 Possibilities with Urethane Chemistry in Radiation Curing Coatings
  by S. Yamamoto ( Sumika Bayer Urethane )
  

• C-17 The Reactivity Investigations of Cyclic Ethers in Cationic Ring-opening Polymerization - Computational Approach -
  by H. Sasaki ( Toagosei )
  

• C-18 A New Double-curable Hyperbranched Ologomwer
  by Y. Wu ( Hunan Yada Science & Technology of New Material )
  

G-7 Emerging Technologies

• E-1 Radical Photoinitiators and Weatherfastness - A Contradiction?
  by T. Jung ( Ciba Specialty Chemicals )
  

• E-2 Self-initiating Monomers Photoinduced Free Radical Polymerization of Vinyl Acrylate
  by S. E. Joensson ( Fusion UV Systems )
  

• E-3 Photo-patterning on Polymer on Polymer Ultra-thin Films Using Scanning Near-field Optical Microscopy with Ultra-violet Light Source
  by H. Aoki ( Kyoto Univ. )
  

• E-4 Effect of Acid Additives on Graft Copolymerization and Water Absorption of Graft Copolymers of Cassava Starch and Acrylamide/Acrylic Acid
  by S. Kiatkamijornwong ( Chulalongkorn Univ. )
  

• E-5 Process Development for 3D UV Curing via Computer Simulation
  by J. K. Okamitsu ( Fusion UV Systems )
  

G-1 Equipment: UV/EB Systems, Laser Sources

• EQ-1 Methods for the Design and Optimization of UV Curing Systems
  by R. W. Stowe ( Fusion UV Systems )
  

• EQ-2 New EB Accelerator System for Science and Engineering
  by M. Washio ( Waseda Univ. )
  

• EQ-3 High Performance Microwave-excited UV Lamp System
  by A. Suzuki ( ORC Manufacturing )
  

• EQ-4 New EB Curing System for Narrow Web, Using Min-EB
  by T. Nakamura ( TOYOINK MFG )
  

• EQ-5 New Development for Low Energy Electron Beam Procsessor
  by T. Takei ( Iwasaki Electric )
  

G-4-4 Photofabrications: 3D-Fabrication, Micro-and Nano-Fabrication

• P-1 High Speed Synthesis of Nanocomposite Materials by UV-radiation Curing
  by C. Decker ( Univ. de Haute Alsace )
  

• P-2 Quantitative Evaluation of Scratch Resistance of Organic-inorganic Hybrid Hard Coatings
  by J. Ueda ( JSR )
  

• P-3 Positive-tone Photopatterning in Polymer Langmuir-blodgett Films Studied by Surface Plasmon Spectroscopy
  by M. Mitsuishi ( Tohoku Univ. )
  

• P-4 Microfluidic Device for Biochemical Analysis
  by A. Teramae ( Kawamura Institute of Chemical Research )
  

• P-5 Development and Evaluation of Radical Curable "ABS" Like Resin for Stereolithography
  by S. Nushi ( Mitsubishi Rayon )
  

• P-6 Development of Resins with High Heat Distortion Temperature for Three-dimentional Photofabrications
  by T. Yashiro ( JSR )
  

G-4-5 Electronics: UV/EB and X-ray Resists, Printed Circuit Boards, Lithographic Process

• EL-1 A New Type of Lithography Materials with Polymer Langmuir-blodgett Films
  by T. Miyashita ( Tohoku Univ. )
  

• EL-2 Preparation of Polysilane/silica Hybrid Thin Films and their Optical Properties
  by K. Matsukawa ( Osaka Municipal Technical Research Institute )
  

• EL-3 Positive Resist by the Use of Photocrosslinkable Polymers Having Redissolution Properties
  by H. Okamura ( Osaka Prefecture Univ. )
  

• EL-4 Characteristics of 157nm Fluoropolymer Resist
  by T. Ogata ( Tokyo Ohka Kogyo )
  

• EL-5 New Fluoropolymers for 157nm Lithography: Synthesis, Characterization, and Photochemical Reaction of Fluoropolyethers
  by A. Kameyama ( Kanagawa Univ. )
  

• EL-6 Silsesquioxane Based 157nm Photoresist: An Update
  by T. Chiba ( JSR )
  

• EL-7 Structure-property Functions of Photoacid Generators for Use in Advanced Chemically Amplified Photoresists
  by J. Cameron ( Shipley )
  

• EL-8 A Novel Electron Beam-induced Reaction of a Sulfonium Salt for EB-resist Materials
  by Y. Maekawa ( Japan Atomic Energy Research Institute )
  

• EL-9 Novel I-line Sensitive Photoacid Generators and their Application to Photoresist Systems
  by C. Iwashima ( Kansai Paint )
  

• EL-10 Resist Material for Two-dimensional Micromirror Array Direct Imager
  by T. Itoh ( Hitachi Chemical )
  

• EL-11 Novel Principle for Preparing Photosensitive Engineering Plastics: Reaction Development Patterning (RDP)
  by T. Oyama ( Yokohama National Univ. )
  

• EL-12 Development of the Dye Dissolved Negative Photoresist for Color Filter
  by N. Horiguchi ( Nippon Kayaku )
  

G-4-3 Adhesives: Laminating, Pressure Sensitive, Release Coating

• AD-1 Delayed Curing Adhesive (DCA) - Photo-cationic Polymerization Type Adhesive -
  by K. Kojima ( Three Bond )
  

• AD-2 Development of Photo-curable Elastic Adhesives with New Photo-crosslinking Reaction of Alkoxy Silyl Groups
  by H. Fukui ( Sekisui Chemical )
  

• AD-3 Novel Adhesive Tapes for Fabricating Stacked Packages of Semiconductors
  by N. Saiki ( LINTEC )
  

• AD-4 Application of Acrylic Polymers with Maleimide Group to UV Curable Pressure Sensitive Adhesives
  by K. Yachi ( Toagosei )
  

G-4-2 Coatings: Wood, Metala, Inorganic Materials, Plastics, Papers

• CO-1 Photo-sensitized Cachionic Polymerization in Film Coating Systems
  by K. Kawamura ( Matsui Chemical )
  

• CO-2 Scratch and Abrasion Resistance of Radiation Cured Coatings
  by N. G. Salleh ( MINT )
  

• CO-3 Ways to Increase Abrasion Resistance of UV Coatings
  by F. Hu ( Hunan Yada Science & Technology of New Materials )
  

• CO-4 Modification of Plywood Surface By Photocuring: Effect of Fillers and Pretreatment
  by K. R. Amin ( Bangladesh Atomic Energy Commission )
  

• CO-5 Improvement of Plain Board Surface with Epoxy Diacrylate by Photocuring: Effect of Additives
  by M. A. Habib ( Univ. of Dhaka )
  

• CO-6 The 3rd Dimension in Radiation Curing
  by M. Biehler ( BASF )
  

• CO-7 UV Curable Anti Static Agent
  by Y. Tao ( Shin-Nakamura Chemical )
  

• CO-8 Development of UV-curable Hybrid Coating Comprised Organic and Inorganic Components for Automotive Headlamp Lens
  by K. Furukawa ( Mitsubishi Rayon )
  

• CO-9 Photo-induced Crosslinking Systems for Automotive Refinish Paints
  by S. Tomita ( Kansai Paint )
  

• CO-10 UV Curable Water-bone Floor Polish, "WINUP"
  by T. Kanie ( GEN Maintenance Technology )
  

• CO-11 Ultra-fine Polyamide Powders as Additives in UV-curing Systems
  by K. Loyen ( ATOFINA )
  

• CO-12 Modification of Jute Yarn by Photografting with HDDA: Influence of Pretreatment with Radiation( UV and Gamma ) and Alkali
  by S. Shehrzade ( Bangladesh Atomic Energy Commission )
  

S-1 New Trend in Display Technology

• D-1 Azobenzene Polyesters for Optical Information Storage and Other Optical Application
  by S. Hvilsted ( Technical Univ. of Denmark )
  

• D-2 Photonic Crystal Structure Formed by Polymer Particles Containing Azobenzene Moieties
  by A. Shishido ( Tokyo Institute of Technology )
  

• D-3 Formation of Polarization Sensitive Surface Grafting in Photo-cross-linkable Polymer Liquid Crystal
  by N. Kawatsuki ( Himeji Institute of Technology )
  

• D-4 Amorphous Molecular Materials for Information Recording and Display
  by Y. Shirota ( Osaka Univ. )
  

• D-5 Liquid Crysatalline Photonic Band Gap Materials
  by W. Cao ( Kent State Univ. )
  

• D-6 Orientation Photocontrol of Liquid Crystal Systems by Photosensitive Polymer Thin Films
  by K. Ichimura ( Tokyo Univ. of Science )
  

• D-7 Alignment Control of Highly Ordered Liquid Crystals by Infrared Laser Incidence: Toward a New Fabrication Technology for Functional Polymers with Built-in Micro/Nano-sized Structures
  by Y. Shimizu ( National Institute of Advanced Industrial Science and Technology )
  

• D-8 A Normal-incidence Single-exposure Scheme to Obtain Pretilt Angle on Photo-alignment Polymer Layers
  by M. Kimura ( JSR )
  

• D-9 The Highly Transparent Anisotropic Film Containing a Swallow-tailed Liquid Crystalline Acrylate
  by Y. Ono ( Dainippon Ink and Chemicals )
  

S-2 Green Chemistry in Radiation Curing

• GR-1 Radiation Curable Coatings: A Variety of Technologies for a Variety of Applications
  by K. Buysens ( UCB Chemical )
  

• GR-2 Photoinitiator Free System Based on Photopolymerizable Oligomer of Maleimide
  C. K. Nguyen ( Albemarle )
  

• GR-3 Development of Photo-induced Polymerizable Maleimide - LUMICURE MIA200
  H. Yonehara ( Dainippon Ink and Chemicals )
  

• GR-4 Photo-curability Study of Bis-maleimides and their Application to UV Curable Pressure Sensitive Adhesives
  by E. Okazaki ( Toagosei )
  

• GR-5 Development of the Heat-adhesion Type of ABS Cable
  by K. Moriuchi ( Sumitomo Electric )
  

G-4-6 Information Transfer and Recording: Optical Fibers, Optical Media

• IT-1 High-speed Plastic Optical Fiber for Broadband Network
  by Y. Koike ( Keio Univ. )
  

• IT-2 Influence of Temperature on Propagation Loss for Polymeric Waveguides
  by T. Utaka ( JSR )
  

• IT-3 Optical Fiber Interconnection by Using Self-written Waveguide
  by F. Huang ( JSR )
  

• IT-4 Design of UV-curable Coatings for Optical Fibers
  by K. Yamaguchi ( Kansai Paint )
  

• IT-5 Designing of DVD Bonding Adhesive and its Chemical Properties
  by K. Murakami ( Dainippon Ink and Chemicals )
  

• IT-6 New Bonding Method for DVD-RAM with Spin-coating Using a Cationic Adhesive
  by D. Ito ( Dainippon Ink and Chemicals )
  

• IT-7 Application of a UV Curable Resin for Novel Higj-density Optical Disc
  by J. Fujimoto ( Mitsubishi Rayon )
  

• IT-8 Electric Gated Diarylethene Materials for Photon Mode Optical Storage
  by F. Zhang ( Tsinghua Univ. )
  

• PM-1 Degree of Cure: Mechanistic Aspects, determination, and Possibilities of On-line Monitoring
  by A. Tauber ( Institute fuer Oberflaechenmodifizierung )
  

• PM-2 On-line Monitoring of the Degree of Cure by NIR Spectroscopy
  by T. Scherzer ( Institute fuer Oberflaechenmodifizierung )
  

• PM-3 Establishing and Maintaining a UV Process Window
  by J. Raymont ( Electronic Instrumentation and Technology )
  

• PM-4 Dosimetry for a Few Hundred keV Electron Beams
  by T. Kojima ( JAERI )
  

• PM-5 Direct Comparisons between High and Low UV Intensity Irradiation on Acrylate Double Bond Conversion
  by R. Bao ( Fusion UV Systems )
  

• PM-6 Accelerated and Natural Weathering of Polyethylene Films Crosslinked with γ-radiation for Outdoor Applications
  by A. A. Basfer ( Atomic Energy Research Institute )
  

• PP-1 EB Curable Solutions for Flexible Packaging
  by M. Laksin ( Sun Chemical )
  

• PP-2 New Low Cost Low Voltage EB Equipment and its Application in Flexible Packaging
  by I. Rangwalla ( Energy Sciences )
  

• PP-3 EB Printing for Polyester Fabrics
  by I. Enomoto ( Tokyo Metropolitan Industrial Technology Research Institute )
  

• PP-4 UV Curing Technology: Issues for Inkjet Formulations
  by K. Jeffrey ( Sartomer )
  

• PP-5 Rheological Requirements for UV Flexo Inks
  by K. Endou ( Dainippon Ink and Chemicals )
  

• PP-6 DOD Piezo Inkjet: Is Radcure the Perfect Partner?
  by I. N. Bhattacharya ( UCB Asia Pacific )
  

• PP-7 The Development of UV Curable Ink-Jet Ink
  by K. Suzuki ( T&K TOKA )
  

• NP-1 New Low Emission Photoinitiators for Coatings and Inks
  by T. Bolle ( Ciba Specialty Chemicals )
  

• NP-2 Difunctional Photoinitiators
  by M. Visconti ( Lamberti )
  

• NP-3 A New Class of Amine Synthesis for Type II Photoinitiators
  by C. K. Nguyen ( Albemarle )
  

• NP-4 Novel Diaryliodonium Salts for Cationic Photopolymerization
  by A. Shirai ( Nippon Soda )
  

• SP-1 Prime IT for Superior Adhesion of UV-cured Systems on Polymers
  by G. Macor ( Ciba Specialty Chemicals )
  

• SP-2 UV Treatment for Oily Surface
  by T. Kawai ( Three Bond )
  

• BM-1 New Light Curable Formulations for Dental Materials
  by K.-D. Ahn ( Korea Istitute of Science and Technology )
  

• BM-2 Soft X-ray Microscopy for Molecular Imaging in a Biological Cell
  by A. Ito ( Tokai Univ. )
  

• BM-3 Comparative Studies of Swelling and Controlled-release on Photopolymerized Polyampholyte and Neutral Hydrogels
  by L.-T. Ng ( Univ. of Western Sydney )
  

• BM-4 HEMAPC and HEMA Hydrogels Grafted onto the PDMS Surfaces by Laser Irradiation: Platelet Adhesion Study
  by M. T. Khorasani ( Iran Polymer and Petrochemical Institute )
  

• BM-5 Kinetics Studies of Photopolymerization Initiated by Donor/Acceptor Pair Systems Based on NVP with a Series of N-hydroxy Alkylmaleimides and Hydrogels Formation via these Systems
  by S. Swami ( Univ. of Western Sydney )
  

• BM-6 Utilization of Bio-resources by Low Energy Electron Beam
  by T. Kume ( JAERI )