AREA OVERVIEW

• O1 Overview and Update on Radiation Curing Market and Technology Development in North America
  by D. Harboune ( Fusion UV Systems, Inc., USA )
  

• O2 European UV/EB Market
  by P. Goethals ( Cytec Surface Specialities, Belgium )
  

• O3 Perspectives on Radiation Curing Industry in Asia
  by V. Luo ( Cytec Surface Specialities, Belgium )
  

• O4 Radiation Curing Technology Progress and its Industrial Applications in Japan
  by T. Ukachi ( JSR Corp. Japan )
  

• O5 Status of Radiation Curing in Thailand
  by S. Kiatkamjomwong ( Chulalongkorn Univ., Thailand )
  

• O6 Growth and Use of UV/EB Curing Technology in China
  by W. Shi ( Univ. of Science and Technology of China, China )
  

NOVEL PHOTOINITIATION SYSTEMS

• NP1 New Multi-Component Photoinitiating Systems based on Bisimidazole Derivative
  by X. Allonas ( Ecole Nationale Supereure de Chimie, France )
  

• NP2 Synthesis and Characterization of Novel HABI as Photoinitiators for Dry Film Resist
  by L. Shengzhou ( Shanghai Jiao Tong Univ. , China )
  

• NP3 Investigation on Properties of Novel Macromolecular Photoinitiators
  by H. Shidian ( Insight High Technology Co., Ltd., China )
  

• NP4 Novel Cationic Photoinitiator
  by M. Visconti ( Lamberti S.p.A., Italy )
  

• NP5 Effect of Iodonium Salt Initiator on Electron Beam Curing of Epoxy Reain
  by S. Gang ( Beijing Univ. of Chemical Technology, China )
  

• NP6 Novel Multi-Branched Two-Photon Polimerization Dyes of Ketocoumarin Derivatives
  by Y. Zhao ( Technical Inst. of Phisics and Chemistry, Chinese Academy of Sciences, China )
  

• NP7 Photo-DSC Study of Kinetics for Photopolimerization of Trimethylolpropane Triacrylate(TMPTA) Initiated by Polymeric Photoinitiator Containing In-chain Thioxanthone and Coinitiator Amine
  by J. Xuesong ( Shanghai Jiao Tong Univ. , China )
  

• NP8 Photoinitiator Reactivity : a New Approach
  by X. Allonas ( Ecole Nationale Supereure de Chimie, France )
  

• NP9 Novel Ketocoumarin Derivatives as Photosensitive Dyes for Two-Photon Photopolymerization
  by F. Wu ( Technical Inst. of Phisics and Chemistry, Chinese Academy of Sciences, China )
  

• NP10 Evaluation of Properties of Benzophenone-based Photoinitiators
  by Z. Wenchao ( Beijing Insight High Technology Co.,Ltd., China )
  

• NP11 The Synthesis of Novel Coumarin Dyes and the Study of Their Photoreaction Properties
  by T. Wang ( Technical Inst. of Phisics and Chemistry, Chinese Academy of Sciences, China )
  

• NP12 Synthesis and Photo-Initiating Cationic Polymerization of Triarylsulfonium Hexafluoroantimate Salt
  by M. El-Maazawi ( Wuhan Univ., China )
  

• NP13 Triarylsulfonium Salt Photo-initiating Cationic Cationic Polymerization of Epoxy Monomers
  by J. Xu ( Beijing Univ. of Chemical Technology, China )
  

• NP14 Study on Photoinitiators and Pignents of UV-Curable Inkjet Ink for Digital Printing
  by L. Wenbin ( Shanghai DonhuaUniv., China )
  

• NP15 The Thermal Decomposition Property of PAGs and the Application on Thermal Sensitive CTP Plates
  by W. Liyuan ( Beijing Normal Univ., China )
  

• NP16 Study on Photoinitiation Properties of HABI with Etheroxyl Groups
  by Y. Shi ( Shanghai Jiao Tong Univ. , China )
  

RAW MATERIALS

• R1 Hyperbranched Polymers for Hardcoat with Superior Performances
  by D. James ( Perstorp Speciality Chemicals AB, Sweden )
  
  

• R2 Photopolymerization and Properties of Waterborne Polyurethane Acrylate Dispersions Based on Hyperbranched Aliphatic Polyesters
  by A. Asif ( Univ. of Science and Technology of China, China )
  

• R3 Development of Dioxolane Structured Acrylate Monomer with Slight Skin Irritation
  by S. Hamada ( Osaka Organic Chemical Ind.,Ltd., Japan )
  

• R4 Reworkable Photocrosslinking Polymers
  by M. Shirai ( Osaka Prefecture Univ., Japan )
  

• R5 UV Coatings for Plastics
  by I. Bhattachsrya ( Cytec Surface Specialities, Belgium )
  

• R6 Recent Advances in UV-curing of Acrylic Resins
  by C. Decker ( Ecole Nationale Supereure de Chimie de Mulhouse-Universite de Haute-Alsace, France )
  

• R7 Study of the Reactivity of Monovinyl (Meth)Acrylates Containing Secondary Functionalities: Effect of spacer Length
  by J. Nie ( Univ. of Cororad at Boulder, USA )
  

• R8 New low Viscous Urethane Acrylates
  by W. Fischer ( Bayert (China) Limited, Coatings Laoratory, Germany )
  

• R9 Synthesis and Photocuring Behaviour of Urethane Vinyl Ether Crystalline Monomer
  by Z. Zeng ( School of Chemistry and Chemical Engineering, Sun Yat-sen Univ., China )
  

• R10 Synthesis and Properties of Photocurable Multifunctional Modified Epoxy Acrylate Oligomers
  by J. S. Kim ( Niwon Commercial Co. Ltd., Korea )
  

• R11 Preparation of Radiation Curable Urrethane Prepolymers from Palm Oil Based Polyol
  by M. H. Mahmood ( MINT, Malaysia )
  

• R12 UV Curable Hyperbranched Polyurethane Acrylate/Epoxy Acrylate Blends
  by W. Zhang ( Univ. of Science and Technology of China, China )
  

• R13 Toughness Improvement of Epoxy Resins for Photo Fabrication
  by T. Tanabe ( JSR Corp., Japan )
  

• R14 Tecnology and Market Trend of New Acrylic Oligomers and Cyclic Ethers
  by I. Igarashi ( Toagosei Co., Ltd., Japan )
  

• R15 Creation of New Reactions of Oxetanes and Their Application to the Development of Photo-curable Polymers
  by T. Nishikubo ( Kanagawa Univ., Japan )
  

• R16 A Phosphorus-Containing Acrylate Oligomer Being Used for UV Curable Flame Rtardant Coatings
  by Z. Huang ( Univ. of Science and Technology of China, China )
  

• R17 Oligomers That Cure Without Photoinitiators
  by J. A. Leon ( Bomar Specialties, USA )
  

• R18 Study on UV-Curable Resins for Sterelithography
  by L. Zhang ( Central China Univ., China )
  

• R19 Synthesis of Polyuretane Acrylate with High Toughness and Its Application
  by W. Song ( Human Univ., China )
  

• R20 Tougher Cycloaliphatic Epoxy Resins for Cationic UV Cure
  by W. Carter ( The Dow Chemical Company, USA )
  

APPLICATIONS

• A1 O2 Inhibition Versus Segmental Mobility Double Bond Residue as a Function of Initial Viscosity
  by S. Joensson ( Fusion UV Systems Inc., USA )
  

• A2 Introduction of recent wide Processability Under Coating for Aluminum Metalized Processing
  by H. Ozu ( Mitsubishi Rayon Co., Ltd., Japan )
  

• A3 UV-Applications in the Automotive Industry
  by O. Startmann ( IST METZ GmbH, Germany )
  

• A4 Process Conditions For UV Sealer on SMC Body Panels
  by K. H. Joessl ( Fusion UV Systems, Inc., USA )
  

• A5 Study on Improving Weatherability of UV-curable Clearcoats
  by F. Hu ( Cental South Univ., China )
  

• A6 Intmescent Flame Retardant Systems for UV Curable Coatings
  by Q. Wang ( Univ. of Science and Technology of China, China )
  

• A7 Curing Properties of Cycloaliphatic Epoxides Derivatives
  by H. Sasaki ( Toagosei Co., Ltd., Japan )
  

• A8 Dual Cure System for Coatings Application
  by S. Panfeng ( Hangcheung Paint (Huiyang) Co., Ltd., China )
  

• A9 Dual-Curable Acrylic Pressure Sensitive Adhesives Based on UV and Thermal Process
  by Y.-B. Kim ( Q-SYS Co., Ltd., South Korea )
  

• A10 UV Adhesive for Image Sensor Packages
  by Y. Abe ( NAMICS Corp., Japan )
  

• A11 Optimising Matt Effects in 100% UV Curing Systems
  by D. J. Kent ( GRACE GmbH & Co. KG, Germany )
  

• A12 Manufacturing of a High Performance Film by the EB Curing Technology
  by Y. Masuda ( C. I. Kasesi Co., Ltd. Japan )
  

• A13 New Developments of UV Resins and Formulations for Plastic Hard Topcoats
  by E. Muzeau ( Cytec Surface Specialities, Belgium )
  

• A14 UV Commercialization of LED Curing
  by S. B. Siegel ( UV Processs Supply, Inc., USA )
  

• A15 UV Printing in the Chinese Graphic Arts Industry
  by d. Jagers ( IST METZ GmbH, Germany )
  

• A16 Photolithographic Fluorescent Patternig in Polymer Films by Dry Process Based on Chemical Amplification
  by K.-D. Ahn ( Korea Inst. of Science and Technology, Korea )
  

• A17 Photon Mode Color Display Materials by Means of Isomerization of Chiral Azobenzene
  by S. Kunihara ( Kumamoto Univ., Japan )
  

• A18 Horographic Gratings Recorded on Amphiphilic Liquid-Crystalline Diblock Copolymer With Nano-Scaled Phase Separation
  by H. Yu ( Tokyo Inst. of Technology, Japan )
  

• A19 Self-Aligned Connection Between Fiber Array and Splitter by Selt-Written Waveguides
  by F. Huang ( JSR Corp. Japan )
  

• A20 Radiation Curable Technology in Electronics
  by N. Maejima ( Cytec Surface Specialities, Belgium )
  

• A21 Raw Materials for High Performance UV Flexo Inks
  by J. Goodrich ( Sartomer Company, USA )
  

• A22 Photosensitive Polyimide Based on Poly(amic acid) and Thermal Imidization at 200�Ž with Photo-Base Generator
  by K. Furukawa ( Tokyo Inst. of Technology, Japan )
  

• A23 Photoinduced Deformation of Polymer Films
  by T. Ikeda ( Tokyo Inst. of Technology, Japan )
  

• A24 Photomechanical Effect of Azobenzene Liquid-Crystalline Elastomers
  by Y. Yu ( Fudan Univ., China )
  

• A25 UV and Visible Curing and Properties of Powder Coatings based Onallylether, Meleimide and Acrylic Binders
  by D. Burget ( Universite de Mulhouse, France )
  

• A26 The Latest Trend of UV Offset Printing- Hybrid Ink and Related Application
  by T. Okuda ( Dainippon Ink and Chemicals, Co., Ltd., Japan )
  

• A27 Radcure Markets: Trends Across Regions
  by E. Zhao ( Frost & Sullivan, China )
  

• A28 Radiation Curing Technology in Liquid Photo-Imageable Solder Mask(LPISM)
  by G. Itokawa ( Taiyoink Mfg. Co., Ltd., Japan )
  

• A29 Application of Dual Cure Coatings
  by Z. Xue ( Jiangsu Sanmu Group, China )
  

• A30 Photoalignment of Liquid Crystals Using Photo-Cross-Linkable Epoxy Resin Polymer
  by C.-W. Chang ( Eternal Chemical Co., Ltd.,Chinese Taiper )
  

• A31 UV or not UV-the Drivers Behide the Fastest Growing Inkjet Technology
  by S. Partridge ( Web Consulting Lt., UK )
  

• A32 Accelerated UV Irradiation for Films of Low Density Polyethylene(LDPE) and Linear Low Density Polyethylene(LLDPE) for Outdoor Applications
  by A. A. Basfar ( Inst. of Atomic Energy Research, Saudi Arabia )
  

• A33 Preparation of Seaweed(Sodium Alginate) Bio-Blends with Polyvinyl Chloride(PVA) by Photo-Curing
  by M. A. Khan ( Inst. of Nuclear Science and Technology, Bangladesh )
  

• A34 Role of Urea on the Phisico-Mechanical and Degradable Properties of Mercerized and Acid Hydrolyzed Coir(Cocos nucifera) Fiber Photocured(UV Irradiated) with 1,6-Hexanediole Diacrylate
  by M. A. Khan ( Inst. of Nuclear Science and Technology, Bangladesh )
  

• A35 Modification and Characterization of Oil Palm Empty Fruit Bunch(Elaeis Guineesis) Fiber by Photo-Curing with Different Acrylic Monomers and Various Functionalities
  by Jahan, T. F. A. ( Univ. of Dhaka, Bangladesh )
  

• A36 UV Hard Coating Application for the Products Development and Research in Precision Coating Technology
  by H.-l. Chen ( AGI Corp., Chinese Taipei )
  

• A37 Modification of Jute Yarn with Ethylene Glycol(EG) by Photocuring: Effect of Surface Treatment with KMnO4 Along with UV Radiation
  by Choudhury, T. R. ( Univ. of Dhaka, Bangladesh )
  

• A38 Syudy on Physico-Mechanical Properties of Photo-Cured Chitosan Films with Oligomer and Acrylic Monomers
  by R. Alam ( Inst. of Nuclear Science and Technology, Bangladesh )
  

• A39 Surface Modification of Pure Cellulose(Filter Paper Whatman 41) with 1-Vinyl-2-Pyrolidon(NVP) by Photocuring: Effect of Urea
  by Ashraf, S. ( Univ. of Dhaka, Bangladesh )
  

• NA1 Hybrid Oligomers - Organic/Inorganic Acrylics
  by G. W. Ceska ( Sartomer Company Inc., USA )
  

• NA2 The Development and Application of One Step Spray UV Coating with Mica
  by H. -C. Lai ( AGI Corp., Chinese Taipei )
  

• NA3 Preparation a Thiol Siloxane Colloid for UV-Curable Organic-Inorganic Films Based on Norbornene Linseed Oil
  by J. He ( Beijing Univ. of Chemical Technology, China )
  

• NA4 Preparation and Charactrization of UV Curable ZnS/Hyperbranched Pokyester Nanocomposite
  by Y. Zhau ( Univ. of Science and Technology of China, China )
  

• NA5 Synthesis of Silicone-Epoxy Monomers Bearing Methoxy-Substituted Benzyl Ether Groups as Highly Reactive Monomers for Cationic Photopolymerization
  by R. A. Ortiz ( Centro de Investigacion en Quimica Aplicada, Mexico )
  

• NA6 A Novel UV-Curable Inorganic/Organic Hybrid Urethane Acrylate
  by J. Xu ( c)
  

• NA7 Cationic Polymerization of an Organic/Inorganic Hybrid Oxetane Compound Bearing Cycloaliphatic Epoxide
  by K. Hatanaka ( The Yokohama Rubber Co., Ltd., Japan )
  

• NA8 Electron Beam Curing Characterization and Mechanism Analysis of Nano-SiO2/Bisphenol A Epoxy Resin System
  by Y. Li ( Beijing Univ. of Aeronautics and Astronautics, China )
  

• NA9 Organic/Inorganic Hybrid Based on Hyperbranched Aliphatic Polyester/Polyester Acrylate
  by Z. Yang ( Univ. of Science and Technology of China, China )
  

• NA10 Stabilized Dispersion of Titania Nanoparticle in UV-Curable Matrix through Sol-Gel Process
  by Y. Jianwen ( Sun Yat-Sen Univ., China )
  

• NA11 Scratch and Abration Properties of the Nanocomposites
  by N. G. Salleh( MINT Research, Malaysia )
  

• NA12 The Preparation and Properties of Nanometer Sized Polyacrylamide/Fe3O4 Particles in Reverse Microemulsion via UV Initiating Method
  by Q. Zhang ( Northwestern Polytechnical Univ., China )
  

• NA13 Additives Made with Nanomateials - Paradigm Shift in UV-curable Coating Formulation
  by A. Kreutzer ( BYK-Chemie GmbH, Germany )
  

EQUIPMENT AND MEASUREMENTS

• E1 Design and Verification of Exposure of Complex Surfaces in 3-D UV Curing Systems
  by R. W. Stowe ( Fusion UV Systems Inc., USA )
  

• E2 High-Performance UV Lamp System
  by D. Maruyama ( ORC Manufacturing Co.,Ltd., Japan )
  

• E3 State of the Art in UV Equipment
  by M. Jiang( IST METZ China, China )
  

• E4 Process and Qualty Control during UV Curing of Acrylate Coatings Using Near-Infrared Reflection Spectroscopy
  by T. Schertzer ( Leibniz IOM, Germany )
  

• E5 Kinetic Study of UV Radiation Curing of the Mixtures Based on Oxetane and Epoxide by Real Time FT-IR
  by Z. Qiu ( Kanagawa Univ., Japan )
  

• E6 Assigment of Photoinitiating Species Using MALDI-TOFMS
  by M. Kaji ( Hitachi Chemical Co.,Ltd. Japan )
  

• E7 Solid-State MNR Analysis of Irrdiasted Fluoropolymers
  by Y. Numata ( NIAS, Japan )
  

• E8 Radiation Curing - A Technology in the "Spot of the Light"
  by M. Biehler ( BASF AG, Germany )
  

• E9 Economic Advantages of In-Line Printing, Coating and Laminating using Low Voltage EB Equipment
  by I. Rangwalla ( Energy Sciences Inc., USA )
  

• E10 Compact Low-energy E-beam Irradiator
  by B. C. Lee ( Korea Atomic Energy Research Inst., Korea )
  

• E11 Research on the Performance of Different Nd-doped GdVO4 Lasers
  by Hu, H. Zh. ( Yantai Univ., China )
  

PHOTOPOLYMERIZATION AND RADIATION MODIFICATION

• PH1 On the Radiation-Induced Polymerization of Cyclic and Aliphatic Vinyl Ethers
  by S. Naumov ( Leibniz IOM, Germany )
  

• PH2 UV Curing and Cure Grafting of Acrylates, Vinyl Ethers, CT Complexes and Thiol-Enes on Cellulose Using a Novel LED Lamp
  by J. L. Garnett ( Radcure Australia Inc., Australia )
  

• PH3 Fabrication of PEFC Membrane Bassed on Fluorinated-Polymer Alloy by Radiation-Grafting
  by A. Oshima ( Waseda Univ., Japan )
  

• PH4 Novel Solventless Surface Modification of Low Density Polyethylene(LDPE) Through Electron Beam Radiation Grafting of 2-Hydroxyethyl Methacrylate(HEMA)
  by J. Morshedian ( Iran Polymer & Petrochemical Inst., Iran )
  

• PH5 Improvement of Surface Energy of Polypropylene by Corona Discharge and Argon Plasma Treatments
  by S. Phattanaudee ( Chulalongkorn Univ., Thailand )
  

• PH6 Correlation between Zeta Potential of Plasma Irradiated Polydimethylsiloxane Surfaces and Their Bio Compatibility
  by M. T. Khorasani ( Iran Polymer & Petrochemical Inst., Iran )
  

• PH7 Self-Initiating Performance of Maleic Anhydride and Styrene on Surface Photografting Polymerization
  by J.-P. Deng ( Beijing Univ. of Chemical Technology, China )
  

• PH8 Modification of the Physico-Mechanical Properties of the Sago Starch/PVA Film using Ultraviolet Radiation and Monomers
  by S. K. Bhattacharia ( Inst. of Nuclear Science and Technology, Bangladesh )
  

• PH9 Recent Technical Trends and Some Topics in the Photopolymers used for Manufacturing of Printed Wiring Boards
  by T. Yamada ( Hitachi Chemical Co., Ltd., Japan )
  

• PH10 Study on the Mechanical Properties of Photo-cured Chitosan Films with Ethylene Glycol
  by Hauque, P. ( Univ. of Dhaka, Bangladesh )
  

POSTERS

• PO1 Photoinitiating Systems for Hybrid Sol-gel Coatings: Toward Enhanced Materials for UV-Curing Applications
  by C. Croutxe-barghorn ( Univ. of Haute-Alsace, France )
  

• PO2 Photo-Reactivity and Films Properties of Hyperbranched Poly(ester)s and Poly(urethane)s Containing Methacryloyl Groups
  by JK. Maruyama ( Kanagawa Univ., Japan )
  

• PO3 Photo-Reactivity Study on Bis-Maleimides
  by E. Okazaki ( Toagosei Co., Ltd., Japan )
  

• PO4 Investigation of the Adhesion in (Meth)Acrylate Systems
  by K. Inata ( Toagosei Co., Ltd., Japan )
  

• PO5 Influence of Nano Powders on Performances of White UV Curable Powder Coatings
  by J. Wei ( Beijing Univ. of Chemical Technology, China )
  

• PO6 Novel Vegetable Oil Macromonomers for Use in Thiol-Ene UV Curable Coatings: Synthesis, Characterization, and Coating Formulation
  by M. S. Black ( The Univ. of Southern Mississippi, USA )
  

• PO7 The Selection of Photo-initiator for UV Silk-screen Covering Ink and the Disquisition of Ink Opacity
  by H. Peiding ( Beijing Inst. of Graphic Communication, China )
  

• PO8 Enhancement of the Flame Retardancy of the Phosphorus Containing Radiation Curing Fireproofing Coating
  by L. Chun-xu ( Beijing Univ. of Chemical Technology, China )
  

• PO9 Dispersion Polymerization of Acrylamide Initiated by UV Light
  by W. Wei ( Beijing Univ. of Chemical Technology, China )
  

• PO10 ESR Study on Behavior of Macromolecular Tert-Amine in Photopolymerization
  by F. Sun ( Beijing Univ. of Chemical Technology, China )
  

• PO11 Characterization of Four Monofunctional Acrylate Monomers and their Applications in UV Curing Systems
  by Technology Department ( Tisnjin Tianjiao Chemical Co., Ltd., China )
  

• PO12 Effects of Silica Nanoparticles on the Kinetics and Surface Properties of UV-curable Polyester Acrylate Coatinga
  by J. -D. Cho ( Q-SYS Co., Ltd., Korea )